Fluorescence Nanoscopy: Eluding the Diffraction Limit by Switching Markers

Andreas Schönle; Stefan W. Hell

doi:10.1364/CLEO_SI.2011.CThW3

CLEO:2011 - Laser Applications to Photonic Applications
OSA Technical Digest (CD) (Optica Publishing Group, 2011),
paper CThW3
•https://doi.org/10.1364/CLEO_SI.2011.CThW3

Fluorescence Nanoscopy: Eluding the Diffraction Limit by Switching Markers

Andreas Schönle and Stefan W. Hell

CLEO: Science and Innovations 2011

Baltimore, Maryland United States
1–6 May 2011
ISBN: 978-1-55752-910-7

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Advances in Biological Microscopy (CThW)

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A. Schönle and S. W. Hell, "Fluorescence Nanoscopy: Eluding the Diffraction Limit by Switching Markers," in CLEO:2011 - Laser Applications to Photonic Applications, OSA Technical Digest (CD) (Optica Publishing Group, 2011), paper CThW3.

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Abstract

By transiently confining adjacent emitters to different states the diffraction limit in light microscopy can be overcome. We will discuss this fundamental concept underlying all current far-field nanoscopy approaches and present recent applications.

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