Abstract
The fabrication of Diffractive Optical Elements (DOEs) in the form of continuous microrelief structures with programmable, complex phase profiles is still a challenging application of modern microlithographic technology. This paper describes the status and recent results of a laser writing system which has been built-up at the Paul Scherrer Institute in Zurich (PSIZ) and constantly refined over recent years.
© 1992 Optical Society of America
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