Abstract
Progress in laser-produced plasma EUV generation for advanced micro-lithography is reviewed and compared with industry requirements. Performance of a high power diode-pumped Nd:YAG laser and a xenon target is presented, demonstrating that intense emission and clean operation are feasible, and these sources can meet EUV power requirements for high-volume manufacturing.
© 2003 Optical Society of America
PDF ArticleMore Like This
Bruno La Fontaine
AFA4 Conference on Lasers and Electro-Optics: Applications (CLEO:A&T) 2010
R. C. Spitzer and D. P. Gaines
SEL.243 Extreme Ultraviolet Lithography (EUL) 1994
C. Keyser, C-S. Koay, K. Takenoshita, M. Richardson, M. Al-Rabban, and E. Turcu
CFH1 Conference on Lasers and Electro-Optics (CLEO:S&I) 2003