Precision Motion and Control for Scanning Beam Interference Lithography

Andre Sharon

doi:10.1364/FIO.2007.FTuE3

Frontiers in Optics 2007/Laser Science XXIII/Organic Materials and Devices for Displays and Energy Conversion
OSA Technical Digest (CD) (Optica Publishing Group, 2007),
paper FTuE3
•https://doi.org/10.1364/FIO.2007.FTuE3

Precision Motion and Control for Scanning Beam Interference Lithography

Andre Sharon

Frontiers in Optics 2007

San Jose, California United States
16–20 September 2007
ISBN: 1-55752-846-2

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Precision Engineering in Optics (FTuE)

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A. Sharon, "Precision Motion and Control for Scanning Beam Interference Lithography," in Frontiers in Optics 2007/Laser Science XXIII/Organic Materials and Devices for Displays and Energy Conversion, OSA Technical Digest (CD) (Optica Publishing Group, 2007), paper FTuE3.

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Abstract

Precision motion and control is crucial in patterning nanometer-scale diffraction gratings over large optical substrates with sub-wave errors using scanning beam interference lithography. Innovative design and integration of commercial technologies can meet the strict requirements.

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