10nm-Level Focusing of Hard X-Rays by KB Mirrors

K. Yamauchi

doi:10.1364/FIO.2009.FThG3

Frontiers in Optics 2009/Laser Science XXV/Fall 2009 OSA Optics & Photonics Technical Digest
OSA Technical Digest (CD) (Optica Publishing Group, 2009),
paper FThG3
•https://doi.org/10.1364/FIO.2009.FThG3

10nm-Level Focusing of Hard X-Rays by KB Mirrors

K. Yamauchi

Frontiers in Optics 2009

San Jose, California United States
11–15 October 2009
ISBN: 978-1-55752-878-0

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Nanofocusing Optics II (FThG)

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K. Yamauchi, "10nm-Level Focusing of Hard X-Rays by KB Mirrors," in Frontiers in Optics 2009/Laser Science XXV/Fall 2009 OSA Optics & Photonics Technical Digest, OSA Technical Digest (CD) (Optica Publishing Group, 2009), paper FThG3.

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Abstract

10nm-level line-focusing of hard X-ray of the wavelength of 0.06nm was achieved by using an elliptically figured and multilayer coated mirror with an on-site wavefront correction system.

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