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Conferences > FiO > 2011 > FTuM > FTuM2

High Precision Matrix Laser Lithography for Fabrication of Novel Types of Optical Security Elements

Marek Škereň, Jakub Svoboda, Martin Nývlt, and Pavel Fiala

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Abstract

Laser matrix lithography device is presented which can be used for fabrication of various diffractive structures including novel types of optical security elements. New ideas in encryption of information using diffractive elements are presented.

© 2011 Optical Society of America

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