Wavefront-Aberration Correction Using Binary Amplitude and Polarization Modulation

Y. Li; C. Dorrer

doi:10.1364/FIO.2016.FF3G.5

Frontiers in Optics 2016
OSA Technical Digest (online) (Optica Publishing Group, 2016),
paper FF3G.5
•https://doi.org/10.1364/FIO.2016.FF3G.5

Wavefront-Aberration Correction Using Binary Amplitude and Polarization Modulation

Y. Li and C. Dorrer

Frontiers in Optics 2016

Rochester, New York United States
17–21 October 2016
ISBN: 978-1-943580-19-4

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Polarization Control and Measurements (FF3G)

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Y. Li and C. Dorrer, "Wavefront-Aberration Correction Using Binary Amplitude and Polarization Modulation," in Frontiers in Optics 2016, OSA Technical Digest (online) (Optica Publishing Group, 2016), paper FF3G.5.

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Abstract

We investigate a simple method to correct aberrations using binary-amplitude and binary-polarization pupil masks. A Cr-on-quartz mask and liquid crystal device experimentally lead to a significant Strehl ratio improvement for an aberrated laser beam.

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