Abstract
Interdiffusion is a fabrication technique which is gaining interest in many applications [4] [5] [7] [3] [6]. It modifies the composition of the quantum well yielding a non square potential profile [9]. In order to analyze the effect of interdiffusion on quantum well properties the diffusion length (Ld) is used as a parameter. This is the product of the annealing time and the diffusion coefficient.
© 1996 Optical Society of America
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