Experimental Investigation of CMOS-Compatible Metal-Insulator-Silicon-Insulator-Metal Waveguides

Min-Suk Kwon; Jin-Soo Shin; Sang-Yung Shin

doi:10.1364/IPRSN.2012.IW1B.3

Advanced Photonics Congress
OSA Technical Digest (online) (Optica Publishing Group, 2012),
paper IW1B.3
•https://doi.org/10.1364/IPRSN.2012.IW1B.3

Experimental Investigation of CMOS-Compatible Metal-Insulator-Silicon-Insulator-Metal Waveguides

Min-Suk Kwon, Jin-Soo Shin, and Sang-Yung Shin

Integrated Photonics Research, Silicon and Nanophotonics 2012

Colorado Springs, Colorado United States
17–20 June 2012
ISBN: 978-1-55752-946-6

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Plasmonics and Applications (IW1B)

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M. Kwon, J. Shin, and S. Shin, "Experimental Investigation of CMOS-Compatible Metal-Insulator-Silicon-Insulator-Metal Waveguides," in Advanced Photonics Congress, OSA Technical Digest (online) (Optica Publishing Group, 2012), paper IW1B.3.

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Abstract

Metal-insulator-silicon-insulator-metal waveguides are experimentally investigated. Their fabrication process is explained, and their measured characteristics are discussed. Their measured propagation loss is 0.262 (0.219) dB/µm when the width of silicon is ~156 (~183) nm.

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