Atomic Layer Lithography of Plasmonic Nanogap Structures for Sensing and Spectroscopy

Sang-Hyun Oh

doi:10.1364/LAOP.2014.LM1C.3

Latin America Optics and Photonics Conference
OSA Technical Digest (online) (Optica Publishing Group, 2014),
paper LM1C.3
•https://doi.org/10.1364/LAOP.2014.LM1C.3

Atomic Layer Lithography of Plasmonic Nanogap Structures for Sensing and Spectroscopy

Sang-Hyun Oh

Latin America Optics and Photonics Conference 2014

Cancun Mexico
16–21 November 2014
ISBN: 978-1-55752-825-4

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Designed Structures in Micro and Nano Dimensions for Photonics and Electronics 1 (LM1C)

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S. Oh, "Atomic Layer Lithography of Plasmonic Nanogap Structures for Sensing and Spectroscopy," in Latin America Optics and Photonics Conference, OSA Technical Digest (online) (Optica Publishing Group, 2014), paper LM1C.3.

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Abstract

The localization and enhancement of electromagnetic fields inside a nanometer-wide metal slit can benefit numerous applications in nanoplasmonic sensing, spectroscopy, and nonlinear optics.

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