High Plasmonic Quality Titanium Nitride Thin Films on Si (001) with MgO Buffer

Kai Ding; Dhruv Fomra; Vitaliy Avrutin; Nathaniel Kinsey; Ümit Özgür; Hadis Morkoç

doi:10.1364/FIO.2019.JW3A.71

Frontiers in Optics + Laser Science APS/DLS
OSA Technical Digest (Optica Publishing Group, 2019),
paper JW3A.71
•https://doi.org/10.1364/FIO.2019.JW3A.71

High Plasmonic Quality Titanium Nitride Thin Films on Si (001) with MgO Buffer

Kai Ding, Dhruv Fomra, Vitaliy Avrutin, Nathaniel Kinsey, Ümit Özgür, and Hadis Morkoç

Laser Science 2019

Washington, DC United States
15–19 September 2019
ISBN: 978-1-943580-67-5

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Poster Session III (JW3A)

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K. Ding, D. Fomra, V. Avrutin, N. Kinsey, Ü. Özgür, and H. Morkoç, "High Plasmonic Quality Titanium Nitride Thin Films on Si (001) with MgO Buffer," in Frontiers in Optics + Laser Science APS/DLS, OSA Technical Digest (Optica Publishing Group, 2019), paper JW3A.71.

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Abstract

We demonstrate high plasmonic quality TiN on Si (001) via PE-ALD. Employment of an MgO buffer improved the figure of merit (FoM) at 1550 nm from 2.0 to 2.5 and the peak FoM from 2.4 to 2.8.

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