Abstract
Progress to advanced ultraviolet (UV) nanoimprint lithography using gas permeable templates was reported for reduction of pattern failure, air-trapping issue, and template damage by gases such as nitrogen and oxygen generated from UV cross-linked materials.
© 2019 The Author(s)
PDF ArticleMore Like This
Takao Kameda, Satoshi Takei, Kaori Yasuda, and Naoto Sugino
JW3A.12 Frontiers in Optics (FiO) 2019
J. Nevřela, A. Kuzma, J. Skriniarova, and F. Uherek
M4A.347 Asia Communications and Photonics Conference (ACP) 2019
Yonghui Zhang, Wengang Bi, Zihui Zhang, Tongbo Wei, Zhuo Xiong, Jinmin Li, and Junxi Wang
DTu3D.3 Solid-State and Organic Lighting (SOLED) 2015