Abstract
A laser system based on three-wave mixing is used to generate laser-light at 2-micometer wavelength. This system is used for in-depth studies of the utility of 2-micrometer-driven sources of extreme ultraviolet (EUV) light in Nanolithography.
© 2022 The Author(s)
PDF ArticleMore Like This
Oscar O. Versolato, Ruben Schupp, Lars Behnke, Yahia Y. Mostafa, Zoi Bouza, Adam Lassise, Muharrem Bayraktar, John Sheil, Ronnie Hoekstra, and Wim Ubachs
ETh5A.7 Compact EUV & X-ray Light Sources (EUVXRAY) 2022
John Sheil, Diko J. Hemminga, Mikhail M. Basko, Wim Ubachs, Ronnie Hoekstra, Amanda J. Neukirch, James Colgan, and Oscar O. Versolato
ETh5A.5 Compact EUV & X-ray Light Sources (EUVXRAY) 2022
L. Behnke, R. Schupp, Z. Bouza, J. Scheers, J. Sheil, R. Hoekstra, W. Ubachs, and O.O. Versolato
EF2A.2 Compact EUV & X-ray Light Sources (EUVXRAY) 2020