Abstract
All-dielectric metamaterials can reduce the cross-talk in PICs. We present a numerical study and optimization of metamaterial cladding in silicon technology resulting in decreased minimal gap between waveguides by 53 %.
© 2021 The Author(s)
PDF Article | Presentation VideoMore Like This
Saman Jahani and Zubin Jacob
QTh4A.6 CLEO: QELS_Fundamental Science (CLEO:FS) 2013
Md Borhan Mia, Syed Z. Ahmed, Ishtiaque Ahmed, Yunjo Lee, Minghao Qi, and Sangsik Kim
JTh2F.16 CLEO: Applications and Technology (CLEO:A&T) 2020
Jan Košata and Oded Zilberberg
NoM1E.4 Novel Optical Materials and Applications (NOMA) 2021