Abstract
Optical and physical properties of thin films are intimately related to parameters associated with the applied deposition scheme. For ion-assisted deposition (IAD), controllable changes in parameters such as the ion species, energy, flux, deposition rate, substrate temperature, and back-fill gas pressure can influence, among other properties, the resulting values of refractive index, optical transparency, and laser-induced damage threshold. Dependence of these properties on several IAD parameters is examined for applications in the ultraviolet and visible range for Y2O3 and ZrO2 films. In addition, properties of transparent films produced from metallic starting materials by means of oxygen-ion assist are presented. The index dispersion and transparency, evaluated from spectrophoto- metric measurements with the envelope method, are compared as functions of deposition parameters. High-peak-power ultraviolet laser damage thresholds of Y2O3/SiO2 and ZrO2SiO2 multilayers deposited under parameters selected from preliminary optical performances are also presented. Reproducibility of the obtained properties and application possibilities are discussed.
© 1990 Optical Society of America
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