Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > OAM > 1993 > MYY > MYY.3

Three mask paradigms for sub-half-micrometer photolithography

Marc D. Levenson

Not Accessible

Your library or personal account may give you access

Abstract

Phase-shifting masks of various types enhance the resolution and process window for high-resolution photolithography at the price of increased difficulty in mask design and fabrication.

© 1993 Optical Society of America

PDF Article
More Like This
Phase-shifting mask evaluation using a stepper-equivalent optical aerial image measurementsystem—AIMS

Russell A. Budd, Derek B. Dove, and John L. Staples
MYY.2 OSA Annual Meeting (FIO) 1993

Realities of phase-shifting lithography

F. M. Schellenberg
MYY.4 OSA Annual Meeting (FIO) 1993

Phase-shifted masks for logic circuitry: process latitude versus integration

Lars W. Liebmann, Richard A. Ferguson, Ronald M. Martino, and Tracy J. Weed
MYY.1 OSA Annual Meeting (FIO) 1993

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use