Diffractive optics fabricated by direct write with electron beam on analog resists

Sing H. Lee

doi:10.1364/OAM.1993.WCC.1

OSA Annual Meeting
Technical Digest Series (Optica Publishing Group, 1993),
paper WCC.1
•https://doi.org/10.1364/OAM.1993.WCC.1

Diffractive optics fabricated by direct write with electron beam on analog resists

Sing H. Lee

OSA Annual Meeting 1993

Toronto Canada
3–8 October 1993
ISBN:

From the session
Symposium on Binary and Diffractive Optics: 1 (WCC)

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S. H. Lee, "Diffractive optics fabricated by direct write with electron beam on analog resists," in OSA Annual Meeting, Technical Digest Series (Optica Publishing Group, 1993), paper WCC.1.

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Abstract

To achieve high diffraction efficiencies, it is necessary for diffractive optics to have multi-level phases. With conventional methods of diffractive optics fabrication, n photolithographic masks and etching steps are required to produce 2ⁿ phase levels.

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