Abstract
Thin film filter components are widely deployed in 10 Gb/s transmission systems due to their advantages of high isolation and wide flat top transmission at low cost. In next generation 40 Gb/s systems the system performance is 16 times more sensitive to chromatic dispersion (CD) than 10 Gb/s systems requiring improvements in DWDM filter properties. Until recently, process challenges have limited the number of cavities in a thin film filter (TFF) to typically not more than four. This has limited performance both in width of the flat top passband and in CD and has resulted in some predictions that TFF technology does not have sufficient performance for use in next generation 40 Gb/s systems.1
© 2002 Optical Society of America
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