Ultra-low loss and fabrication tolerant silicon nitride (Si3N4) (de-)muxes for 1-μm CWDM optical interconnects

Stanley Cheung; Michael R. T. Tan

doi:10.1364/OFC.2020.M3F.6

Optical Fiber Communication Conference (OFC) 2020
OSA Technical Digest (Optica Publishing Group, 2020),
paper M3F.6
•https://doi.org/10.1364/OFC.2020.M3F.6

Ultra-low loss and fabrication tolerant silicon nitride (Si₃N₄) (de-)muxes for 1-μm CWDM optical interconnects

Stanley Cheung and Michael R. T. Tan

Optical Fiber Communication Conference 2020

San Diego, California United States
8–12 March 2020
ISBN: 978-1-943580-71-2

From the session
Wavelength Selective Devices (M3F)

Not Accessible

Your library or personal account may give you access

Get PDF
Email
Share
Get Citation
Copy Citation Text
S. Cheung and M. R. T. Tan, "Ultra-low loss and fabrication tolerant silicon nitride (Si3N4) (de-)muxes for 1-μm CWDM optical interconnects," in Optical Fiber Communication Conference (OFC) 2020, OSA Technical Digest (Optica Publishing Group, 2020), paper M3F.6.

Export Citation
- BibTex
- Endnote (RIS)
- HTML
- Plain Text
Citation alert
Save article

Abstract

Low-loss, fabrication-tolerant Si₃N₄ CWDM lattice filters and AWGs are demonstrated for 990 – 1065nm bottom-emitting VCSELs. Channel separation of 25 nm, XT < -35 dB and −20 dB are reported with temperature shift of 14.5 pm/°C.

PDF Article

Previous Article Next Article