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Conferences > OIC > 1992 > OFA > OFA4

Affects of Vacuum Exposure on Stress and Spectral Shift of High Reflective Coatings

C. J. Stolz, J. R. Taylor, W. K. Eickelberg, and J. D. Lindh

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Abstract

When designing an optical system it is imperative that the optics be characterized in the operating environment. In order to maximize transport efficiency an understanding of spectral shift is necessary to optimize incident angles of polarizers and dichroics. Likewise, changes in reflected wavefront due to vacuum can effect beam sizes and image locations as well as transport efficiency.

© 1992 Optical Society of America

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