Abstract

In conventional plasma deposition systems, partial dissociation of the active gases is achieved by exposure to a continuous low power plasma (<5 Wcm^-2). The free radicals so produced diffuse to solid surfaces and react thermally to produce a deposit. This is an efficient process in the production of passivating layers and rudimentary structures. In the fabrication of high quality and sophisticated optical elements such as reflection stacks, rugate filters and etalons, this process had been proven to be highly dependent on such factors as temperature, thermal gradients and gas distribution. Thus complex feedback monitors are normally required, in order to allow fluctuations in deposition rate to be corrected in order that filters be successfully deposited.

© 1992 Optical Society of America