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Conferences > OIC > 2001 > TuF > TuF9

Internal stress properties of fluoride thin films for VUV applications

E. Fukumoto, T. Aoki, and S. Ogura

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Abstract

We deposited MgF2 and LaF3 films on quartz glass plates as anti-reflective coatings for VUV region, and report here their internal stress behavior, adopting in-situ stress measurement.

© 2001 Optical Society of America

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