Abstract
Characterization of high performance films (at the ppm level) present special challenges and require special metrology. We review some of the approaches and instrumentation used to support the challenging film and material characterizations tasks facing the thin film community presented by NSF Programs such UGO, the VIRGO Project and other Programs. Comparisons of the advantages and limitations of these systems are reviewed. Examples of typical results are presented concluding with a discussion of future directions.
© 2007 Optical Society of America
PDF ArticleMore Like This
Ch. Mühlig, W. Triebel, S. Kufert, and H. Bernitzki
WD6 Optical Interference Coatings (OIC) 2007
Alexander V. Tikhonravov, Michael K. Trubetskov, Oleg F. Prosovskiy, and Michael A. Kokarev
WDPDP2 Optical Interference Coatings (OIC) 2007
T. Neubert, W. Sun, F. Neumann, and M. Vergöhl
ThA10 Optical Interference Coatings (OIC) 2007