Properties of Ge and GeOx Thin Films Deposited by Magnetron Sputtering

Marius Grigonis; Markus K. Tilsch; Karen D. Hendrix

doi:10.1364/OIC.2010.MA8

Optical Interference Coatings
OSA Technical Digest (Optica Publishing Group, 2010),
paper MA8
•https://doi.org/10.1364/OIC.2010.MA8

Properties of Ge and GeO_x Thin Films Deposited by Magnetron Sputtering

Marius Grigonis, Markus K. Tilsch, and Karen D. Hendrix

Optical Interference Coatings 2010

Tucson, Arizona United States
6–11 June 2010
ISBN: 978-1-55752-891-9

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M. Grigonis, M. K. Tilsch, and K. D. Hendrix, "Properties of Ge and GeOx Thin Films Deposited by Magnetron Sputtering," in Optical Interference Coatings, OSA Technical Digest (Optica Publishing Group, 2010), paper MA8.

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Abstract

Optical properties of pulsed DC magnetron sputtered Ge and GeO_x layers are reported. Complex multilayer infrared bandpass filters were successfully fabricated. However, these coatings exhibit severe environmental durability issues which may limit their applications.

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