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Conferences > OIC > 2010 > TuC > TuC5

Optical Admittance Monitor through a Dynamic Interferometer

K. Wu, M. C. Li, J. C. Wyant, N. Brock, B. Kimbrough, and C. C. Lee

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Abstract

A way to increase the optical monitoring sensitivity in quarterwave stack fabrication by modified optical admittance loci was demonstrated. The optical admittance value was obtained from an in-situ dynamic interferometer combing with a photodetector, and the result was compared with ellipsometer measurement.

© 2010 Optical Society of America

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