Abstract

A technique for process control and monitoring of thin film deposition has been developed and integrated into a deposition system. The integrated system enables monitoring of the deposition process for each layer of a multilayer system and over a broadband spectrum. The principle advances claimed for this monitor are twofold: novel, fast software design techniques have been used to improve thickness control and it can easily be retro-fitted to existing chambers, integrating the deposition and measurement systems into one remotely controllable unit. Initial results from the new broadband monitor are compared with those obtained by quartz crystal monitoring while depositing a gain flattening filter for a spectrometer light source.

© 2010 Optical Society of America