Photoluminescence of ion beam sputtered HfO2/Al2O3 and HfO2/SiO2 mixtures

Thimotheus Alig; Stefan Günster; Detlev Ristau

doi:10.1364/OIC.2016.ThC.4

Optical Interference Coatings 2016
OSA Technical Digest (online) (Optica Publishing Group, 2016),
paper ThC.4
•https://doi.org/10.1364/OIC.2016.ThC.4

Photoluminescence of ion beam sputtered HfO₂/Al₂O₃ and HfO₂/SiO₂ mixtures

Thimotheus Alig, Stefan Günster, and Detlev Ristau

Optical Interference Coatings 2016

Tucson, Arizona United States
19–24 June 2016
ISBN: 978-1-943580-13-2

From the session
Characterization and Optical Properties (ThC)

Not Accessible

Your library or personal account may give you access

Get PDF
Email
Share
Get Citation
Copy Citation Text
T. Alig, S. Günster, and D. Ristau, "Photoluminescence of ion beam sputtered HfO2/Al2O3 and HfO2/SiO2 mixtures," in Optical Interference Coatings 2016, OSA Technical Digest (online) (Optica Publishing Group, 2016), paper ThC.4.

Export Citation
- BibTex
- Endnote (RIS)
- HTML
- Plain Text
Citation alert
Save article

Abstract

Energy levels of ion beam sputtered hafnia mixed with alumina or silica were investigated by photoluminescence at 193 nm. The emission spectra originating from interstitial defects and oxygen vacancies were correlated to residual optical properties.

PDF Article

Previous Article Next Article

Poster Presentation

Media 1: PDF (701 KB)