Abstract
Multilayers of Mo and SiO2 were grown by magnetron sputtering with layer d-spacings of 20-40Å and fraction Mo about γ= 0.4. Dc biases of -120V were applied during the entire deposition time for some samples. Layer roughness was studied by specular and non-specular x-ray diffraction. In the non-specular scans the bias was observed to increase the peak-background ratio from about 102 to about 103. This is interpreted to show a decrease in interface roughness due to the bias.
© 1994 Optical Society of America
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