Abstract
A novel and very simple ellipsometer for the characterization of film-substrate systems that employs one rotating optical element (a polarizer) is proposed. The ellipsometer is based on detecting the angles of incidence at which a film-substrate system has equal amplitude attenuations for light polarized parallel (p) and perpendicular (s) to the plane of incidence. At a certain wavelength, the film thickness of the film-substrate system has to lie within permissible-thickness bands (PTB) for the technique to apply.
© 1977 Optical Society of America
Full Article | PDF ArticleMore Like This
R. M. A. Azzam and A.-R. M. Zaghloul
J. Opt. Soc. Am. 67(8) 1058-1065 (1977)
R. M. A. Azzam, A.-R. M. Zaghloul, and N. M. Bashara
J. Opt. Soc. Am. 65(12) 1464-1471 (1975)
R. M. A. Azzam, A.-R. M. Zaghloul, and N. M. Bashara
J. Opt. Soc. Am. 65(3) 252-260 (1975)