Abstract
Conjugate wave-front generation by degenerate four-wave mixing has been employed to project images with submicrometer features onto photoresist-coated substrates. The developed patterns demonstrate a resolution of >800 line pairs per millimeter for 413-nm illumination, consistent with theoretical expectations. The patterns are not degraded by speckle or edge enhancement, and the magnification is within 0.1% of unity. Focusing is accomplished by a novel interferometric procedure.
© 1981 Optical Society of America
Full Article | PDF ArticleMore Like This
Richard Barakat and Peter Nisenson
J. Opt. Soc. Am. 71(11) 1390-1402 (1981)
Yoshihiro Ohtsuka and Aris Tanone
J. Opt. Soc. Am. 71(7) 879-883 (1981)
N. B. Baranova, A. V. Mamaev, N. F. Pilipetsky, V. V. Shkunov, and B. Ya. Zel’dovich
J. Opt. Soc. Am. 73(5) 525-528 (1983)