Simple and sensitive technique tor determining refractive nonlinearities

M. SHEIK-BAHAE; A. A. SAID; Y. Y. WU; T. H. WEI; D. J. HAGAN; E. W. VAN STRYLAND

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 1989),
paper THH4

Simple and sensitive technique tor determining refractive nonlinearities

M. SHEIK-BAHAE, A. A. SAID, Y. Y. WU, T. H. WEI, D. J. HAGAN, and E. W. VAN STRYLAND

Conference on Lasers and Electro-Optics 1989

Baltimore, Maryland United States
24–28 April 1989
ISBN: 1-55752-086-0

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Nonlinear Optics: 2 (THH)

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M. SHEIK-BAHAE, A. A. SAID, Y. Y. WU, T. H. WEI, D. J. HAGAN, and E. W. VAN STRYLAND, "Simple and sensitive technique tor determining refractive nonlinearities," in Conference on Lasers and Electro-Optics, R. Bartolini, P. Liao, J. Bufton, and W. Krupke, eds., Vol. 11 of OSA Technical Digest (Optica Publishing Group, 1989), paper THH4.

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Abstract

Nonlinear interferometry and beam profile distortion measurements have been commonly used to study nonlinear refraction in many materials. Interferometry is potentially sensitive but requires a relatively complex experimental apparatus. Beam distortion measurements, on the other hand, require precise beam scans followed by detailed wave propagation analysis. We present a novel method which offers simplicity as well as very high sensitivity in measuring and analyzing such nonlinearities.

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