Abstract

We have previously reported the refractive index changes of fluorinated polyimides caused by electron beam irradiation¹ and the optical waveguide fabrication method using direct electron beam writing (DEBW).^2,3 This method is very useful for fabricating practical opto-electronics devices, because the fabrication process can be simplified compared with that of the conventional method using reactive ion etching (RIE). In this paper, we propose a novel optical waveguide which consists of a single material and a simple two layer structure.

© 1995 IEEE