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Conferences > CLEO_Europe > 1994 > CMG > CMG4

Photochemical modification of teflon using water to generate adhesive properties

Masataka Murahara and Koich Toyoda

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Abstract

A powerful adhesion of teflon featuring its excellent corrosion resistance and stainless steel was performed by using an epoxy resin-based bonding agent. Adhesion strength was 120 times more than that of untreated teflon, which has virtually no affinity with chemicals and solids.

© 1994 IEEE

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