Abstract

Extensive studies of implantation of ions into near surface areas of materials have demonstrated significant improvement of such properties as surface tension, friction and durability. The cost of implanted ions is currently rather high due to the limited ion current density of the usual ion sources, especially if ions from other than gaseous plasma sources must be used. The advent of laser-driven ion sources, with 2-3 orders of magnitude higher currents than classical ion sources, may change the scenario for a wide range of applications, making ion implantation as crucial a manufacturing technology in the future for other industries as it is today for microelectronics.

© 1996 IEEE