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Electron Beam Production of Phase Masks for Direct Writing of Photo-Induced Gratings

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Abstract

Grating based components for integrated optics have long been recognised as potentially very important for the range of functions they enable. In 1978, Hill and co-workers reported the demonstration of gratings directly written into the core of a germanosilicate fibre, by interfering the counterpropagating beams from an Ar ion laser1. Since those initial observations fabrication techniques have been refined and improved to the point where gratings are now commercially available2

© 1996 IEEE

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