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Proximity x-ray lithography using a droplet-target laser-plasma source

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Laser plasmas are attractive sources for proximity x-ray lithography due to their high brightness and comparatively low cost [1]. However, conventional laser-plasma target systems, e.g., bulk metals or thin film tape targets, limit the applicability of these sources. The limitations primarily concerns repetition rate, operating time, target cost and debris emission. In this paper we discuss the use of microscopic liquid droplets formed by a continuous liquid jet as target [2] and show that this target allows low-cost, uninterrupted operation at high repetition rates and practically eliminates the debris problem.

© 1996 IEEE

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