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Conferences > CLEO_Europe > 1998 > CFB > CFB2

Simultaneous UV direct writing of channel waveguides and Bragg gratings in planar germanium doped silica

P.V.S. Marques, J. R. Bonar, X. Liu, A. M. P. Leite, and J.S. Aitchison

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Abstract

Permanent photo induced refractive index changes by means of UV exposure have been used for laser trimming, fabrication of Bragg gratings [1] and direct writing of channel waveguides [2]. Direct writing is particularly attractive since it allows two-dimensional light confinement without the expensive and time consuming dry-etch stage. In this paper we report on the simultaneous production of both a 2-D waveguide and a Bragg grating.

© 1998 IEEE

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