Abstract
Recently considerable improvement of characteristics of pulsed metal vapour and metal halide vapour lasers, such as copper vapour laser, CuBr-H2 and copper HyBrID laser, have been achieved. In [1,2] it was shown that this improvement can be qualitatively explained by the presence of HBr molecule. The influence of HBr can be explained by the process of dissociative attachment of electrons to this molecule which can lead to changes in the pulsed discharge development, recombination of plasma between excitation pulses and probably in electron energy distribution function.
© 1998 IEEE
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