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Conferences > CLEO_Europe > 2021 > ch_9 > ch_9_3
  • 2021 Conference on Lasers and Electro-Optics Europe and European Quantum Electronics Conference
  • OSA Technical Digest (Optica Publishing Group, 2021),
  • paper ch_9_3

Tailoring spatial entropy in extreme ultraviolet focused beams for multispectral ptychography

Xiaomeng Liu, Lars Loetgering, Anne de Beurs, Mengqi Du, Patrick Konold, Kjeld Eikema, and Stefan Witte

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Abstract

We demonstrate a computational approach to designing diffractive optical elements that can be used to focus multispectral extreme-ultraviolet radiation from a high-harmonic generation source. The polychromatic focusing properties are experimentally confirmed using ptychography.

© 2021 IEEE

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