Abstract
We report here high-reflectivity multilayer DBR mirrors in 200-240 nm spectral region. YSZ (yttria-stabilized zirconia), HfO2 and SiO2 films were all prepared by direct RF magnetron sputtering. The film annealing conditions were systematically varied to obtain layers with minimal optical absorption. Combining these results, high reflectivity YSZ/SiO2 and HfO2/SiO2 DBRs were designed and realized with reflectance greater than 99.9%.
© 2016 Optical Society of America
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