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Photoenol Laser Lithography Using Intermediate-State Cis-Trans Isomerization for Writing Inhibition

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Abstract

We introduce photoenol intermediate-state cis-trans isomerization as an inhibition channel, which can serve as STED-like mechanism in laser lithography beyond the diffraction limit. We demonstrate writing, reversible inhibition, and linewidth narrowing.

© 2016 Optical Society of America

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