Ultra-high Q Silica Microcavity Fabrication Using Conventional Photolithography Combined with Chemo-Mechanical Polishing

Shahin Honari; Sanaul Haque; Tao Lu

doi:10.1364/CLEO_AT.2021.JTu3A.85

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 2021),
paper JTu3A.85
•https://doi.org/10.1364/CLEO_AT.2021.JTu3A.85

Ultra-high Q Silica Microcavity Fabrication Using Conventional Photolithography Combined with Chemo-Mechanical Polishing

Shahin Honari, Sanaul Haque, and Tao Lu

CLEO: Science and Innovations 2021

San Jose, California United States
9–14 May 2021
ISBN: 978-1-943580-91-0

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Joint Poster Session I (JTu3A)

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S. Honari, S. Haque, and T. Lu, "Ultra-high Q Silica Microcavity Fabrication Using Conventional Photolithography Combined with Chemo-Mechanical Polishing," in Conference on Lasers and Electro-Optics, J. Kang, S. Tomasulo, I. Ilev, D. Müller, N. Litchinitser, S. Polyakov, V. Podolskiy, J. Nunn, C. Dorrer, T. Fortier, Q. Gan, and C. Saraceno, eds., OSA Technical Digest (Optica Publishing Group, 2021), paper JTu3A.85.

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Abstract

We fabricated ultrahigh Q silica microdisks using conventional photolithog- raphy followed by chemo-mechanical polishing. Through this procedure, optical quality factor exceeding one hundred million was obtained.

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