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Conferences > CLEO_SI > 2022 > STu4F > STu4F.1

Direct Laser Lithography: Single-Tool Patterning for Nonlinear Integrated Quantum Optics

Maximilian Protte, Varun B. Verma, Julian Brockmeier, Jan Philipp Höpker, Felix vom Bruch, Sebastian Lengeling, Raimund Ricken, Christof Eigner, Christine Silberhorn, Richard P. Mirin, Sae Woo Nam, and Tim J. Bartley

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Abstract

We present direct laser lithographic patterning of low-loss waveguides, periodic poling structures for single photon generation, electro-optical modulators and superconducting detectors based on WSi, for integrated quantum circuits in titanium in-diffused lithium niobate.

© 2022 The Author(s)

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