Abstract

We have produced amorphous carbon nitride coatings containing up to 40% nitrogen using ion assisted planar magnetron RF sputtering in a nitrogen atmosphere. Both WDX and XPS indicate this composition. Coatings up to 2 µm thick were produced on alumina, silicon, SiO₂, and glass substrates using a graphite target. Films with 95% transparency in the visible wavelengths and harder than silicon have been produced. XPS studies confirm the stability of a carbon nitrogen phase up to 630 °C. The Raman spectra are compared with those of carbon and carbon nitride films prepared by other methods.

© 1995 Optical Society of America