Abstract

Diamond films have been grown with various morphologies in a hot filament chemical vapor deposition (HFCVD) reactor equipped to monitor the gas phase chemistry. The reactor provided for orifice sampling of gases in the immediate vicinity of the diamond growth surface for introduction into a time-of-flight mass spectrometer. Electron impact ionization was utilized to investigate stable species present during growth. Resonance enhanced multiphoton ionization (REMPI) was employed for the detection of radicals including atomic hydrogen and methyl radical. Measurements have been made of the filament and substrate temperature dependence of the H, CH₃, CH₄, and C₂H₂ relative concentrations.