Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • Applications of Diamond Films and Related Materials: Third International Conference
  • Technical Digest Series (Optica Publishing Group, 1995),
  • paper DGGC437

In Situ OES Diagnosis of the DC ARC Plasma JET in the Systhesis of Diamond

Not Accessible

Your library or personal account may give you access

Abstract

This paper discusses the in situ optical emission spectroscopy system for diagnosis of the DC arc plasma jet used in the synthesis of diamond. The effects of power, the methane flux and the hydrogen flux on the CH, H and C2 species in the plasma as well as on experimental results are analyzed. The work provides basis for better process control and further theoretic research.

© 1995 Optical Society of America

PDF Article
More Like This
Effect of Plasma Flow on Diamond Growth by ARC Discharge Plasma JET CVD

Atsushi Hirata and Masanori Yoshikawa
DGGC417 Applications of Diamond Films and Related Materials (DFM) 1995

Is it Possible to Deposit Diamond in a Microwave Plasma CVD Process Without H2?

Pierre Joeris, Ingo Schmidt, and Carsten Benndorf
DGGC381 Applications of Diamond Films and Related Materials (DFM) 1995

Density measurements in a dc-arc jet by using scanned beam-deflection tomography

Elizabeth Brinkman, Jay B. Jeffries, and Gregory W. Faris
CFN5 Conference on Lasers and Electro-Optics (CLEO:S&I) 1995

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.