Abstract

We report on the lithographic production of a periodic nanostructure in a parallel process [1]. Using the optical dipole force in a standing wave light field a transversely cooled cesium atomic beam is focused into parallel lines (fig. 1). The cesium atoms locally change the wetability of a self assembled monolayer of thioles (nonanthiol) on a gold surface. A subsequent wet etching process transfers the pattern into the underlying gold film (thickness 30 nm). With this method we have generated grooves in the gold film with a separation of 426 nm and a width of about 70 nm (fig. 2).

© 1998 IEEE