Abstract
Using neutral atoms for lithography is a new method of generating nanostructures on a substrate. This method is based on light masks formed by interfering laser beams perpendicular to the atomic beam. One- and two-dimensional periodic structures have been fabricated by various groups [1] using light masks with intensity gradients and uniform polarization. The resulting periods are half the laser wavelength or greater.
© 1998 IEEE
PDF ArticleMore Like This
B. Brezger, P.O. Schmidt, Th. Schulze, A. Bell, T. Pfau, and J. Mlynek
QTuG21 International Quantum Electronics Conference (IQEC) 1998
J. H. Thywissen, K. S. Johnson, R. Younkin, N. H. Dekker, K. K. Berggren, A. P. Chu, and M. Prentiss
CB4 Symposium on Electro-Optics: Present and Future (SEO) 1998
K. S. Johnson, J. H. Thywissen, N. H. Dekker, A. P. Chu, R. Younkin, K.K. Berggren, and M. Prentiss
QThD3 International Quantum Electronics Conference (IQEC) 1998