Abstract

For elucidating the fundamental factors controlling photochemical modifications in the UV ablation of molecular solids, we have undertaken the examination of the fragmentation and reactivity patterns observed in the ablation of condensed films of simple compounds (namely. CH3I, alcohols, ketones, and C6H5X where X=Cl, I, CH_XCl_y;) with well known photodissociation behavior. The chosen compounds are representative of the functional groups encountered in polymers and in Matrix Assisted Laser Desorption substrates.

© 1998 IEEE