Abstract

Ablative photodecomposition of organic materials with excimer lasers has been shown to be useful for etching, surface modification, and thin film deposition. It is widely known that fragments ejected from the surface of polymers by the ablation includes transient intermediates such as C₂, CN radicals, and ions that are analyzed with mass spectrometry and optical emission measurement. On the basis of the previous studies, it is expected that the intermediates reacts with polymer surface.¹ In the present study, we report the chemical reactivity with regard to the intermediates which are produced from pentafluorophenylazide (F5PA) solid film upon KrF excimer laser radiation at a cryogenic temperature. Since F5PA is photodecomposed to a nitrene derivative and nitrogen molecule upon the UV irradiation in a high quantum yield, it means that the fragments contain the reactive nitrene under a optimized condition.

© 1995 IEEE